Intel Adopts ASML's Next-Generation High NA EUV Lithography for Panther Lake Production

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According to ASML, Intel began using ASML's next-generation High Numerical Aperture (High NA) EUV lithography equipment to produce Panther Lake notebook processors on Tuesday (July 15). The move follows experimental trials that started in 2024, with Intel now deploying the advanced tool in full-scale manufacturing to improve production efficiency.
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